TMD growth generation

Issue: Nucleation control

Solution: NaCl additive

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Announces world's 1st thin film MOCVD growth technology for 2D semiconductors. 

Issue: Powder additives

Solution: Sodium propionate additive

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Implementation of all-gas MOCVD with gas-phase additives technology, based entirely on gas-phase precursors. ​

Issue: High growth temperature

Solution: Precursor engineering

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Satisfying thermal budget requirements below 400℃ for 3D structures by precursor engineering.

Issue: Industry imcompatibility

Solution: High-throughput & yield MOCVD

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Achieving high throughput and yield with MOCVD optimized for 2D semiconductor growth.